ArticleJournal of neural engineering2020
Fabrication and modeling of recessed traces for silicon-based neural microelectrodes.
Article in Journal of neural engineering, 2020. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 6 papers.
What it found
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The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.
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Who cites it
6 citing papers in PubMed.
- Short-Term Effects of Gamma Stimulation on Neuroinflammation at the Tissue-Electrode Interface in Motor Cortex.Neuromodulation : journal of the International Neuromodulation Society · 2024Article
- Charge Injection Enhancement Comparisons of Iridium Oxide MicroelectrodesInternational IEEE/EMBS Conference on Neural Engineering : [proceedings]. International IEEE EMBS Conference on Neural Engineering · 2023Article
- A portable neurostimulator circuit with anodic bias enhances stimulation injection capacity.Journal of neural engineering · 2022Article
- A Simple Table-Top Technique for Multi-Signal Pseudo-Extracellular Recording.International IEEE/EMBS Conference on Neural Engineering : [proceedings]. International IEEE EMBS Conference on Neural Engineering · 2021Article
- A Diagnostic Circuit for Crosstalk Detection in Microelectrode Arrays.International IEEE/EMBS Conference on Neural Engineering : [proceedings]. International IEEE EMBS Conference on Neural Engineering · 2021Article
- Unprotected sidewalls of implantable silicon-based neural probes and conformal coating as a solution.Npj Materials degradation · 2021Article
Corrections and comments
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Authors and funding
4 authors.
Funding
Abstract
objectiveChronically-implanted neural microelectrodes are powerful tools for neuroscience research and emerging clinical applications, but their usefulness is limited by their tendency to fail after months in vivo. One failure mode is the degradation of insulation materials that protect the conductive traces from the saline environment. APPROACH: Studies have shown that material degradation is accelerated by mechanical stresses, which tend to concentrate on raised topographies such as conducting traces. Therefore, to avoid raised topographies, we developed a fabrication technique that recesses (buries) the traces in dry-etched, self-aligned trenches. MAIN
resultsThe fabrication technique produced flatness within approximately 15 nm. Finite element modeling showed that the recessed geometry would be expected to reduce intrinsic stress concentrations in the insulation layers. Finally, in vitro electrochemical tests confirmed that recessed traces had robust recording and stimulation capabilities that were comparable to an established non-recessed device design. SIGNIFICANCE: Our recessed trace fabrication technique requires no extra masks, is easy to integrate with existing processes, and is likely to improve the long-term performance of implantable neural devices.
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Registered trials
Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.