Evidence map›Paper›PMID 32855400›Full record

ArticleNature communications2020

High-performance p-channel transistors with transparent Zn doped-CuI.

Ao Liu, Huihui Zhu, Won-Tae Park, Se-Jun Kim, Hyungjun Kim, Myung-Gil Kim, Yong-Young Noh

Abstract read
In one paragraph

Article in Nature communications, 2020. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 19 papers.

0numbers the graph read from it
0cells of the map it votes in
19citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

19 citing papers in PubMed.

  1. Lattice Disorder in CuI Enables Filament-Free Transparent Memristors.Advanced science (Weinheim, Baden-Wurttemberg, Germany) · 2026
    Article
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  8. Limits to Hole Mobility and Doping in Copper Iodide.Chemistry of materials : a publication of the American Chemical Society · 2023
    Article
  9. Article
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  12. High-performance and low-power source-gated transistors enabled by a solution-processed metal oxide homojunction.Proceedings of the National Academy of Sciences of the United States of America · 2023
    Article
  13. Article
  14. Article
  15. Article
  16. Atomic Layer Deposition of Metal Oxides and Chalcogenides for High Performance Transistors.Advanced science (Weinheim, Baden-Wurttemberg, Germany) · 2022
    Review
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  18. Article
  19. Review
4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

7 authors.

Ao Liu *Department of Chemical Engineering, Pohang University of Science and Technology, Pohang, Gyeongbuk, 37673, Republic of Korea.
Huihui Zhu *Department of Chemical Engineering, Pohang University of Science and Technology, Pohang, Gyeongbuk, 37673, Republic of Korea.
Won-Tae ParkDepartment of Electrical and Computer Engineering, University of Waterloo, 200 University Avenue West, Waterloo, ON, N2L 3G1, Canada.ORCID http://orcid.org/0000-0002-7646-1204
Se-Jun KimDepartment of Chemistry, Korea Advanced Institute of Science and Technology, Daehak-ro 291, Yuseong-gu, Daejeon, 34141, South Korea.
Hyungjun KimDepartment of Chemistry, Korea Advanced Institute of Science and Technology, Daehak-ro 291, Yuseong-gu, Daejeon, 34141, South Korea.
Myung-Gil KimSchool of Advanced Materials Science and Engineering, Sungkyunkwan University, Suwon, 16419, Republic of Korea. myunggil@skku.edu.ORCID http://orcid.org/0000-0002-8607-5972
Yong-Young NohDepartment of Chemical Engineering, Pohang University of Science and Technology, Pohang, Gyeongbuk, 37673, Republic of Korea. yynoh@postech.ac.kr.

Funding

National Research Foundation of Korea (NRF) (2017R1E1A1A01075360
6 · The paper itself

Abstract

'Ideal' transparent p-type semiconductors are required for the integration of high-performance thin-film transistors (TFTs) and circuits. Although CuI has recently attracted attention owing to its excellent opto-electrical properties, solution processability, and low-temperature synthesis, the uncontrolled copper vacancy generation and subsequent excessive hole doping hinder its use as a semiconductor material in TFT devices. In this study, we propose a doping approach through soft chemical solution process and transparent p-type Zn-doped CuI semiconductor for high-performance TFTs and circuits. The optimised TFTs annealed at 80 °C exhibit a high hole mobility of over 5 cm

Identifiers

PMID32855400
PMCPMC7453006

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Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.