Evidence map›Paper›PMID 32610624›Full record

ArticleMicromachines2020

Batch Fabrication of Silicon Nanometer Tip Using Isotropic Inductively Coupled Plasma Etching.

Lihao Wang, Meijie Liu, Junyuan Zhao, Jicong Zhao, Yinfang Zhu, Jinling Yang, Fuhua Yang

Abstract read
In one paragraph

Article in Micromachines, 2020. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 3 papers.

0numbers the graph read from it
0cells of the map it votes in
3citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

3 citing papers in PubMed.

  1. Article
  2. Article
  3. Article
4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

7 authors.

Lihao WangInstitute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China.
Meijie LiuInstitute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China.
Junyuan ZhaoInstitute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China.
Jicong ZhaoJiangsu Key Laboratory of ASIC Design, Nantong University, Nantong 226019, China.
Yinfang ZhuInstitute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China.
Jinling YangInstitute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China.
Fuhua YangInstitute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China.

Funding

National Natural Science Foundation of China 61734007National Natural Science Foundation of China 61804150The National Key Research and Development Program of China 2018YFF01010300
6 · The paper itself

Abstract

This work reports a batch fabrication process for silicon nanometer tip based on isotropic inductively coupled plasma (ICP) etching technology. The silicon tips with nanometer apex and small surface roughness are produced at wafer-level with good etching homogeneity and repeatability. An ICP etching routine is developed to make silicon tips with apex radius less than 5 nm, aspect ratio greater than 5 at a tip height of 200 nm, and tip height more than 10 μm, and high fabrication yield is achieved by mask compensation and precisely controlling lateral etch depth, which is significant for large-scale manufacturing.

Indexed as

high aspect ratioinductively coupled plasma etchingnanometer tipsmall apex

Identifiers

PMID32610624
PMCPMC7408416

What OpenQuestion holds

Textmetadata
LicenceCC BY
Read underepoch 390

Registered trials

None linked

Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.