ArticleNature electronics2018
Metrology for the next generation of semiconductor devices.
Article in Nature electronics, 2018. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 54 papers.
What it found
Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.
The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.
The trial behind it
Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.
Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.
Who cites it
54 citing papers in PubMed.
- Direction-resolved nanoscale optical imaging with near-nanometer resolution by emerging infrared torsional force microscopy.Nature communications · 2026Article
- Atomic Force Microscopy (AFM)-Based Metrology for Advanced Etching in Three-Dimensional Integrated Circuits.Micromachines · 2026Review
- Dynamically Reconfigurable XNOR/IMP Logic Based on Dual-Mechanism Operation in an Electrically Tunable Two-Dimensional Heterojunction.Nanomaterials (Basel, Switzerland) · 2026Article
- 3D atomic-scale metrology of strain relaxation and roughness in Gate-All-Around transistors via electron ptychography.Nature communications · 2026Article
- Enhancing Discharge Performance and Image Lag Characteristics in PIN Diode X-Ray Sensors with a Reset Transistor.Sensors (Basel, Switzerland) · 2026Article
- A universal all-dry microfabrication method for sensitive electronic materials via an inorganic molecular lithographic mediator.Nature communications · 2026Article
- Deep learning and superoscillatory speckles empowered multimode fiber probe for in situ nano-displacement detection and micro-imaging.Nature communications · 2026Article
- AI-based analysis algorithm incorporating nanoscale structural variations and measurement-angle misalignment in spectroscopic ellipsometry.Nanophotonics (Berlin, Germany) · 2025Article
- Inverted PAINT for Material-Specific Super-Resolution Fluorescence Imaging of Semiconductors.Advanced materials (Deerfield Beach, Fla.) · 2025Article
- Ultrafast Dynamic Defect Inspection With Computational Neuromorphic Imaging.Advanced science (Weinheim, Baden-Wurttemberg, Germany) · 2025Article
- Ultra-wide-field imaging Mueller matrix spectroscopic ellipsometry for semiconductor metrology.Nature communications · 2025Article
- Structure-in-Void Quasi-Bound State in the Continuum Metasurface for Deeply Subwavelength Nanostructure Metrology.ACS nano · 2025Article
- AI-Powered Next-Generation Technology for Semiconductor Optical Metrology: A Review.Micromachines · 2025Review
- Characterization of Sub-Optical-Wavelength Structures through Optically Opaque Films Using Picosecond Ultrasonics.Nano letters · 2025Article
- Ellipsometric Surface Oxidation Model of ALD-Grown Vanadium Oxide Mixed-Valence System.Nanomaterials (Basel, Switzerland) · 2025Article
- DOF Enhanced via the Multi-Wavelength Method for the Moiré Fringe-Based Alignment.Micromachines · 2025Article
- Nanophotonic inspection of deep-subwavelength integrated optoelectronic chips.Science advances · 2025Article
- Quantum magnetometry of transient signals with a time resolution of 1.1 nanoseconds.Nature communications · 2025Article
- Article
- Nanometer Interlaced Displacement Metrology Using Diffractive Pancharatnam-Berry and Detour Phase Metasurfaces.ACS photonics · 2024Article
Corrections and comments
PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.
Authors and funding
10 authors.
Funding
Abstract
The semiconductor industry continues to produce ever smaller devices that are ever more complex in shape and contain ever more types of materials. The ultimate sizes and functionality of these new devices will be affected by fundamental and engineering limits such as heat dissipation, carrier mobility and fault tolerance thresholds. At present, it is unclear which are the best measurement methods needed to evaluate the nanometre-scale features of such devices and how the fundamental limits will affect the required metrology. Here, we review state-of-the-art dimensional metrology methods for integrated circuits, considering the advantages, limitations and potential improvements of the various approaches. We describe how integrated circuit device design and industry requirements will affect lithography options and consequently metrology requirements. We also discuss potentially powerful emerging technologies and highlight measurement problems that at present have no obvious solution.
Indexed as
Identifiers
What OpenQuestion holds
Registered trials
Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.