ArticleScience advances2019
Shear-solvo defect annihilation of diblock copolymer thin films over a large area.
Article in Science advances, 2019. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 8 papers.
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Who cites it
8 citing papers in PubMed.
- Flow-Induced Microdomain Alignment During Block Copolymer Graphoepitaxy.Advanced materials (Deerfield Beach, Fla.) · 2026Article
- Fully Transparent and Distortion-Free Monotonically Stretchable Substrate by Nanostructure Alignment.Advanced materials (Deerfield Beach, Fla.) · 2025Article
- Unidirectional motion of topological defects mediating continuous rotation processes.Npj spintronics · 2025Article
- Article
- Roll-to-plate 0.1-second shear-rolling process at elevated temperature for highly aligned nanopatterns.Nature communications · 2023Article
- Complex-tensor theory of simple smectics.Nature communications · 2023Article
- Defining Swelling Kinetics in Block Copolymer Thin Films: The Critical Role of Temperature and Vapour Pressure Ramp.Polymers · 2021Article
- Directed Self-Assembly of Block Copolymers for the Fabrication of Functional Devices.Polymers · 2020Review
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Authors and funding
5 authors.
Funding
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Abstract
Achieving defect-free block copolymer (BCP) nanopatterns with a long-ranged orientation over a large area remains a persistent challenge, impeding the successful and widespread application of BCP self-assembly. Here, we demonstrate a new experimental strategy for defect annihilation while conserving structural order and enhancing uniformity of nanopatterns. Sequential shear alignment and solvent vapor annealing generate perfectly aligned nanopatterns with a low defect density over centimeter-scale areas, outperforming previous single or sequential combinations of annealing. The enhanced order quality and pattern uniformity were characterized in unprecedented detail via scattering analysis and incorporating new mathematical indices using elaborate image processing algorithms. In addition, using an advanced sampling method combined with a coarse-grained molecular simulation, we found that domain swelling is the driving force for enhanced defect annihilation. The superior quality of large-scale nanopatterns was further confirmed with diffraction and optical properties after metallized patterns, suggesting strong potential for application in optoelectrical devices.
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Registered trials
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