Evidence map›Paper›PMID 30984475›Full record

ArticleAPL materials2018

Electron beam-based metrology after CMOS.

J A Liddle, B D Hoskins, A E Vladár, J S Villarrubia

Abstract read
In one paragraph

Article in APL materials, 2018. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 2 papers.

0numbers the graph read from it
0cells of the map it votes in
2citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

2 citing papers in PubMed.

  1. Article
  2. Article
4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

4 authors.

J A LiddleNational Institute of Standards and Technology, Gaithersburg, Maryland, 20899, USA.
B D HoskinsNational Institute of Standards and Technology, Gaithersburg, Maryland, 20899, USA.
A E VladárNational Institute of Standards and Technology, Gaithersburg, Maryland, 20899, USA.
J S VillarrubiaNational Institute of Standards and Technology, Gaithersburg, Maryland, 20899, USA.

Funding

Intramural NIST DOC 9999-NIST
6 · The paper itself

Abstract

The magnitudes of the challenges facing electron-based metrology for post-CMOS technology are reviewed. Directed selfassembly, nanophotonics/plasmonics, and resistive switches and selectors, are examined as exemplars of important post-CMOS technologies. Materials, devices, and architectures emerging from these technologies pose new metrology requirements: defect detection, possibly subsurface, in soft materials,

Identifiers

PMID30984475
PMCPMC6459207

What OpenQuestion holds

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Registered trials

None linked

Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.