ArticleSensors (Basel, Switzerland)2019
The Development of CMOS Amperometric Sensing Chip with a Novel 3-Dimensional TiN Nano-Electrode Array.
Article in Sensors (Basel, Switzerland), 2019. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 3 papers.
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Who cites it
3 citing papers in PubMed.
- Innovative CMOS-fabricated dielectrophoretic chip: application of 3D TiN nano-electrode arrays with adjustable electrode spacing in sperm capture.Frontiers in bioengineering and biotechnology · 2025Article
- CMOS-fabricated dielectrophoretic chip with embedded 3D TiN nano-electrode arrays for sperm capture and sperm damage reduction.Frontiers in bioengineering and biotechnology · 2025Article
- Dielectrophoretic capture ofFrontiers in bioengineering and biotechnology · 2024Article
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Authors and funding
2 authors.
Funding
Abstract
An electrochemical sensing chip with an 8 × 8 array of titanium nitride three-dimensional nano-electrodes (TiN 3D-NEA) was designed and fabricated via a standard integrated complementary metal oxide semiconductor process. Each nano-electrode in 3D-NEA exhibited a pole-like structure with a radius of 100 nm and a height of 35 nm. The numeric simulation showed that the nano-electrode with a radius of around 100 nm exhibited a more uniformly distributed electric field and a much higher electric field magnitude compared to that of the microelectrode. Cyclic voltammetry study with Ru(NH₃)₆
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