ArticleMicromachines2018
Resist Filling Study for UV Nanoimprint Lithography Using Stamps with Various Micro/Nano Ratios.
Article in Micromachines, 2018. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 5 papers.
What it found
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The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.
The trial behind it
Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.
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Who cites it
5 citing papers in PubMed.
- Nanoimprint lithography for scalable electronic and photonic nanomanufacturing.Discover nano · 2026Review
- Curvature-Adjustable Polymeric Nanolens Fabrication Using UV-Controlled Nanoimprint Lithography.Micromachines · 2022Article
- Water filling of microcavities.Biomicrofluidics · 2022Article
- UV Nanoimprint Lithography: Geometrical Impact on Filling Properties of Nanoscale Patterns.Nanomaterials (Basel, Switzerland) · 2021Article
- Multilevel nanoimprint lithography with a binary mould for plasmonic colour printing.Nanoscale advances · 2020Article
Corrections and comments
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Authors and funding
3 authors.
Funding
Abstract
Mixed micro- and nanoscale structures are gaining popularity in various fields due to their rapid advances in patterning. An investigation in stamp resist filling with multiscale cavities via ultraviolet (UV) nanoimprint lithography (UV-NIL) is necessary to improve stamp design. Here, simulations at the level of individual features were conducted to explain different filling behaviors of micro- and nanoscale line patterns. There were noticeable interactions between the micro-/nanoscale cavities. These delayed the resist filling process. Several chip-scale simulations were performed using test patterns with different micro/nano ratios of 1:1, 1:2, and 1:3. There were some minor influences that changed the micro/nano ratios on overall imprint qualities. During the imprinting process, the pressure difference at the boundary between micro- and nanoscale patterns became obvious, with a value of 0.04 MPa. There was a thicker residual layer and worse cavity filling when the proportion of nanoscale structures increased.
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Registered trials
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