ArticleBeilstein journal of nanotechnology2017
Process-specific mechanisms of vertically oriented graphene growth in plasmas.
Article in Beilstein journal of nanotechnology, 2017. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 7 papers.
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Who cites it
7 citing papers in PubMed.
- Controllable Fabrication of Vertical Graphene with Tunable Growth Nature by Remote Plasma-Enhanced Chemical Vapor Deposition.ACS omega · 2023Article
- Effects of Substrates on Nucleation, Growth and Electrical Property of Vertical Few-Layer Graphene.Nanomaterials (Basel, Switzerland) · 2022Article
- Synthesis of Vertically Oriented Graphene Sheets or Carbon Nanowalls-Review and Challenges.Materials (Basel, Switzerland) · 2019Review
- Kinetic studies of few-layer graphene grown by flame deposition from the perspective of gas composition and temperature.RSC advances · 2019Article
- Dendrite-Free Li Metal Plating/Stripping Onto Three-Dimensional Vertical-Graphene@Carbon-Cloth Host.Frontiers in chemistry · 2019Article
- Direct CVD Growth of Graphene on Technologically Important Dielectric and Semiconducting Substrates.Advanced science (Weinheim, Baden-Wurttemberg, Germany) · 2018Review
- Nanostructured Graphene Surfaces Promote Different Stages of Bone Cell Differentiation.Nano-micro letters · 2018Article
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6 authors.
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Abstract
Applications of plasma-produced vertically oriented graphene nanosheets (VGNs) rely on their unique structure and morphology, which can be tuned by the process parameters to understand the growth mechanism. Here, we report on the effect of the key process parameters such as deposition temperature, discharge power and distance from plasma source to substrate on the catalyst-free growth of VGNs in microwave plasmas. A direct evidence for the initiation of vertical growth through nanoscale graphitic islands is obtained from the temperature-dependent growth rates where the activation energy is found to be as low as 0.57 eV. It is shown that the growth rate and the structural quality of the films could be enhanced by (a) increasing the substrate temperature, (b) decreasing the distance between the microwave plasma source and the substrate, and (c) increasing the discharge power. The correlation between the wetting characteristics, morphology and structural quality is established. It is also demonstrated that morphology, crystallinity, wettability and sheet resistance of the VGNs can be varied while maintaining the same sp
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