ArticleScientific reports2017
Nanoscale 2.5-dimensional surface patterning with plasmonic lithography.
Article in Scientific reports, 2017. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 3 papers.
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Who cites it
3 citing papers in PubMed.
- The Evolution of Lithography: From Resolution Scaling to Manufacturing Constraints.Micromachines · 2026Review
- Spatial modulation of scalable nanostructures by combining maskless plasmonic lithography and grayscale-patterned strategy.Nanoscale advances · 2023Article
- Application of the Metal Reflector for Redistributing the Focusing Intensity of SPPs.Nanomaterials (Basel, Switzerland) · 2020Article
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Authors and funding
4 authors.
Funding
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Abstract
We report an extension of plasmonic lithography to nanoscale 2.5-dimensional (2.5D) surface patterning. To obtain the impulse response of a plasmonic lithography system, we described the field distribution of a point dipole source generated by a metallic ridge aperture with a theoretical model using the concepts of quasi-spherical waves and surface plasmon-polaritons. We performed deconvolution to construct an exposure map of a target shape for patterning. For practical applications, we fabricated several nanoscale and microscale structures, such as a cone, microlens array, nanoneedle, and a multiscale structure using the plasmonic lithography system. We verified the possibility of applying plasmonic lithography to multiscale structuring from a few tens of nanometres to a few micrometres in the lateral dimension. We obtained a root-mean-square error of 4.7 nm between the target shape and the patterned shape, and a surface roughness of 11.5 nm.
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Registered trials
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