ArticleScience and technology of advanced materials2016
Modeling of metastable phase formation diagrams for sputtered thin films.
Article in Science and technology of advanced materials, 2016. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 4 papers.
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4 citing papers in PubMed.
- CALPHAD-Based Modelling of the Temperature-Composition-Structure Relationship during Physical Vapor Deposition of Mg-Ca Thin Films.Materials (Basel, Switzerland) · 2023Article
- Me-Doped Ti-Me Intermetallic Thin Films Used for Dry Biopotential Electrodes: A Comparative Case Study.Sensors (Basel, Switzerland) · 2021Article
- Kinetically Limited Phase Formation of Pt-Ir Based Compositionally Complex Thin Films.Materials (Basel, Switzerland) · 2020Article
- Metastable phase formation of Pt-X (X = Ir, Au) thin films.Scientific reports · 2018Article
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6 authors.
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Abstract
A method to model the metastable phase formation in the Cu-W system based on the critical surface diffusion distance has been developed. The driver for the formation of a second phase is the critical diffusion distance which is dependent on the solubility of W in Cu and on the solubility of Cu in W. Based on comparative theoretical and experimental data, we can describe the relationship between the solubilities and the critical diffusion distances in order to model the metastable phase formation. Metastable phase formation diagrams for Cu-W and Cu-V thin films are predicted and validated by combinatorial magnetron sputtering experiments. The correlative experimental and theoretical research strategy adopted here enables us to efficiently describe the relationship between the solubilities and the critical diffusion distances in order to model the metastable phase formation during magnetron sputtering.
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