Evidence map›Paper›PMID 27799726›Full record

ArticleJournal of microelectromechanical systems : a joint IEEE and ASME publication on microstructures, microactuators, microsensors, and microsystems2016

Cryogenic Etching of High Aspect Ratio 400 nm Pitch Silicon Gratings.

Houxun Miao, Lei Chen, Mona Mirzaeimoghri, Richard Kasica, Han Wen

Abstract read
PubMed Full text at PMC Publisher
In one paragraph

Article in Journal of microelectromechanical systems : a joint IEEE and ASME publication on microstructures, microactuators, microsensors, and microsystems, 2016. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 2 papers.

0numbers the graph read from it
0cells of the map it votes in
2citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

2 citing papers in PubMed.

  1. Review
  2. Article
4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

5 authors.

Houxun MiaoNational Institutes of Health, Bethesda, MD 20892 USA.
Lei ChenNational Institute of Standards and Technology, Gaithersburg, MD 20899 USA.
Mona MirzaeimoghriNational Institutes of Health, Bethesda, MD 20892 USA.
Richard KasicaNational Institute of Standards and Technology, Gaithersburg, MD 20899 USA.
Han WenNational Institutes of Health, Bethesda, MD 20892 USA.

Funding

X-Ray Phase Contrast Imaging Concepts and SystemsZIAHL004606 · NHLBI · NATIONAL HEART, LUNG, AND BLOOD INSTITUTE · PI WEN, HAN · 2009 to 2022
$10.1M
TECHNOLOGICAL DEVELOPMENT OF HIGH FIELD MAGNETIC RESONANCE IMAGINGZ01HL004606 · NHLBI · NATIONAL HEART, LUNG, AND BLOOD INSTITUTE · PI WEN, HAN · 1997 to 2008
$4.3M
Technical development of x-ray phase contrast imagingZIAHL006171 · NHLBI · NATIONAL HEART, LUNG, AND BLOOD INSTITUTE · PI WEN, HAN · 2013 to 2019
$4.3M
Intramural NIH HHS Z01 HL004606
6 · The paper itself

Abstract

The cryogenic process and Bosch process are two widely used processes for reactive ion etching of high aspect ratio silicon structures. This paper focuses on the cryogenic deep etching of 400 nm pitch silicon gratings with various etching mask materials including polymer, Cr, SiO

Indexed as

Cryogenic silicon etchingdeep reactive ion etchinghigh aspect ratio silicon grating

Identifiers

PMID27799726
PMCPMC5084849

What OpenQuestion holds

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Registered trials

None linked

Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.