ArticleScientific reports2016
High speed e-beam writing for large area photonic nanostructures - a choice of parameters.
Article in Scientific reports, 2016. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 8 papers.
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Who cites it
8 citing papers in PubMed.
- The effect of long-term ambient storage on the morphology of adhered DNA origami.Computational and structural biotechnology journal · 2026Article
- Small Feature-Size Transistors Based on Low-Dimensional Materials: From Structure Design to Nanofabrication Techniques.Advanced science (Weinheim, Baden-Wurttemberg, Germany) · 2024Review
- Inverse design and optical vortex manipulation for thin-film absorption enhancement.Nanophotonics (Berlin, Germany) · 2023Article
- Scalable Fabrication of Metallic Nanogaps at the Sub-10 nm Level.Advanced science (Weinheim, Baden-Wurttemberg, Germany) · 2021Review
- Direct X-ray and electron-beam lithography of halogenated zeolitic imidazolate frameworks.Nature materials · 2021Article
- Dewetting behavior of Ge layers on SiOScientific reports · 2020Article
- Concurrent design of quasi-random photonic nanostructures.Proceedings of the National Academy of Sciences of the United States of America · 2017Article
- Chirped guided-mode resonance biosensor.Optica · 2017Article
Corrections and comments
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Authors and funding
11 authors.
Funding
No grant is acknowledged in the PubMed record.
Abstract
Photonic nanostructures are used for many optical systems and applications. However, some high-end applications require the use of electron-beam lithography (EBL) to generate such nanostructures. An important technological bottleneck is the exposure time of the EBL systems, which can exceed 24 hours per 1 cm(2). Here, we have developed a method based on a target function to systematically increase the writing speed of EBL. As an example, we use as the target function the fidelity of the Fourier Transform spectra of nanostructures that are designed for thin film light trapping applications, and optimize the full parameter space of the lithography process. Finally, we are able to reduce the exposure time by a factor of 5.5 without loss of photonic performance. We show that the performances of the fastest written structures are identical to the original ones within experimental error. As the target function can be varied according to different purposes, the method is also applicable to guided mode resonant grating and many other areas. These findings contribute to the advancement of EBL and point towards making the technology more attractive for commercial applications.
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Registered trials
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