ArticleScientific reports2016
Single-photon-multi-layer-interference lithography for high-aspect-ratio and three-dimensional SU-8 micro-/nanostructures.
Article in Scientific reports, 2016. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 6 papers.
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Who cites it
6 citing papers in PubMed.
- Cascade upconversion: a strategy enabling four-photon lithography in weak light intensity.Nature communications · 2025Article
- Self-aligned multi-layer X-ray absorption grating using large-area fabrication methods for X-ray phase-contrast imaging.Scientific reports · 2023Article
- Fabrication of Tapered 3D Microstructure Arrays Using Dual-Exposure Lithography (DEL).Micromachines · 2020Article
- Near-field sub-diffraction photolithography with an elastomeric photomask.Nature communications · 2020Article
- Glassy Carbon: A Promising Material for Micro- and Nanomanufacturing.Materials (Basel, Switzerland) · 2018Review
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2 authors.
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Abstract
We report microstructures of SU-8 photo-sensitive polymer with high-aspect-ratio, which is defined as the ratio of height to in-plane feature size. The highest aspect ratio achieved in this work exceeds 250. A multi-layer and single-photon lithography approach is used in this work to expose SU-8 photoresist of thickness up to 100 μm. Here, multi-layer and time-lapsed writing is the key concept that enables nanometer localised controlled photo-induced polymerisation. We use a converging monochromatic laser beam of 405 nm wavelength with a controllable aperture. The reflection of the converging optics from the silicon substrate underneath is responsible for a trapezoidal edge profile of SU-8 microstructure. The reflection induced interfered point-spread-function and multi-layer-single-photon exposure helps to achieve sub-wavelength feature sizes. We obtained a 75 nm tip diameter on a pyramid shaped microstructure. The converging beam profile determines the number of multiple optical focal planes along the depth of field. These focal planes are scanned and exposed non-concurrently with varying energy dosage. It is notable that an un-automated height axis control is sufficient for this method. All of these contribute to realising super-high-aspect-ratio and 3D micro-/nanostructures using SU-8. Finally, we also address the critical problems of photoresist-based micro-/nanofabrication and their solutions.
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