ArticleAngewandte Chemie (International ed. in English)2015
Radicals Are Required for Thiol Etching of Gold Particles.
Article in Angewandte Chemie (International ed. in English), 2015. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 10 papers.
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Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.
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Who cites it
10 citing papers in PubMed.
- PbSensors (Basel, Switzerland) · 2024Article
- Article
- An Overview on Coinage Metal Nanocluster-Based Luminescent Biosensors via Etching Chemistry.Biosensors · 2022Review
- Thermodynamically Stable Colloidal Solids: Interfacial Thermodynamics from the Particle Size Distribution.The journal of physical chemistry. C, Nanomaterials and interfaces · 2022Article
- Revealing the etching process of water-soluble AuNature communications · 2021Article
- Control of single-ligand chemistry on thiolated AuNature communications · 2020Article
- pH-Responsive Au(i)-disulfide nanoparticles with tunable aggregation-induced emission for monitoring intragastric acidity.Chemical science · 2020Article
- Preparation of high-yield and ultra-pure AuNanoscale · 2019Article
- Insights into the Synthesis Mechanism of AgThe journal of physical chemistry. C, Nanomaterials and interfaces · 2018Article
- Practical Stability of Au25(SR)18RSC advances · 2017Article
Corrections and comments
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Authors and funding
2 authors.
Funding
Abstract
Etching of gold with an excess of thiol ligand is used in both synthesis and analysis of gold particles. Mechanistically, the process of etching gold with excess thiol is unclear. Previous studies have obliquely considered the role of oxygen in thiolate etching of gold. Herein, we show that oxygen or a radical initiator is a necessary component for efficient etching of gold by thiolates. Attenuation of the etching process by radical scavengers in the presence of oxygen, and the restoration of activity by radical initiators under inert atmosphere, strongly implicate the oxygen radical. These data led us to propose an atomistic mechanism in which the oxygen radical initiates the etching process.
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Registered trials
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