In vitro treatment of Candida albicans biofilms on denture base material with volume dielectric barrier discharge plasma (VDBD) compared with common chemical antiseptics.

objectivesTo prevent oral candidiasis, it is crucial to inactivate Candida-based biofilms on dentures. Common denture cleansing solutions cannot sufficiently inactivate Candida albicans. Therefore, we investigated the anticandidal efficacy of a physical plasma against C. albicans biofilms in vitro. MATERIALS AND

methodsArgon or argon plasma with 1 % oxygen admixture was applied on C. albicans biofilms grown for 2, 7, or 16 days on polymethylmethacrylate discs; 0.1 % chlorhexidine digluconate (CHX) and 0.6 % sodium hypochlorite (NaOCl) solutions served as positive treatment controls. In addition, these two solutions were applied in combination with plasma for 30 min to assess potential synergistic effects. The anticandidal efficacy was determined by the number of colony forming units (CFU) in log(10) and expressed as reduction factor (RF, the difference between control and treated specimen).

resultsOn 2-day-biofilms, plasma treatment alone or combined with 30 min CHX treatment led to significant differences of means of CFU (RF = 4.2 and RF = 4.3), clearly superior to CHX treatment alone (RF = 0.6). Plasma treatment of 7-day-or 16-day-old biofilms revealed no significant CFU reduction. The treatment of 7-day-old (RF = 1.7) and 16-day-old (RF = 1.3) biofilms was slightly more effective with NaOCl alone than with the combined treatment of NaOCl and plasma (RF = 1.6/RF = 1.9). The combination of CHX and plasma increased the RF immaterially.

conclusionThe use of plasma alone and in combination with antiseptics is promising anticandidal regimens for daily use on dentures when biofilms are not older than 2 days. CLINICAL RELEVANCE: Plasma could help to reduce denture-associated candidiasis.