ArticleBeilstein journal of nanotechnology2014
High speed e-beam lithography for gold nanoarray fabrication and use in nanotechnology.
Article in Beilstein journal of nanotechnology, 2014. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 8 papers.
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Who cites it
8 citing papers in PubMed.
- Pentagonal photonic crystal mirrors: scalable lightsails with enhanced acceleration via neural topology optimization.Nature communications · 2025Article
- In Situ Fabrication of Freestanding Single-Atom-Thick 2D Metal/Metallene and 2D Metal/ Metallene Oxide Membranes: Recent Developments.Advanced science (Weinheim, Baden-Wurttemberg, Germany) · 2021Review
- Advances in Plasmonic Sensing at the NIR-A Review.Sensors (Basel, Switzerland) · 2021Review
- High-Tech and Nature-Made Nanocomposites and Their Applications in the Field of Sensors and Biosensors for Gas Detection.Biosensors · 2020Review
- Modulating Tumor Cell Functions by Tunable Nanopatterned Ligand Presentation.Nanomaterials (Basel, Switzerland) · 2020Review
- A 17 GHz molecular rectifier.Nature communications · 2016Article
- High speed e-beam writing for large area photonic nanostructures - a choice of parameters.Scientific reports · 2016Article
- Polymer blend lithography for metal films: large-area patterning with over 1 billion holes/inch(2).Beilstein journal of nanotechnology · 2015Article
Corrections and comments
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Authors and funding
8 authors.
Funding
No grant is acknowledged in the PubMed record.
Abstract
E-beam lithography has been used for reliable and versatile fabrication of sub-15 nm single-crystal gold nanoarrays and led to convincing applications in nanotechnology. However, so far this technique was either too slow for centimeter to wafer-scale writing or fast enough with the so-called dot on the fly (DOTF) technique but not optimized for sub-15 nm dots dimension. This prevents use of this technology for some applications and characterization techniques. Here, we show that the DOTF technique can be used without degradation in dots dimension. In addition, we propose two other techniques. The first one is an advanced conventional technique that goes five times faster than the conventional one. The second one relies on sequences defined before writing which enable versatility in e-beam patterns compared to the DOTF technique with same writing speed. By comparing the four different techniques, we evidence the limiting parameters for the writing speed. Wafer-scale fabrication of such arrays with 50 nm pitch allowed XPS analysis of a ferrocenylalkyl thiol self-assembled monolayer coated gold nanoarray.
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