ArticleAdvanced materials (Deerfield Beach, Fla.)2014
Coherent X-ray diffraction imaging and characterization of strain in silicon-on-insulator nanostructures.
Article in Advanced materials (Deerfield Beach, Fla.), 2014. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 2 papers.
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2 citing papers in PubMed.
- Advances in Structural and Morphological Characterization of Thin Magnetic Films: A Review.Materials (Basel, Switzerland) · 2023Review
- Article
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5 authors.
Funding
Abstract
Coherent X-ray diffraction imaging (CDI) has emerged in the last decade as a promising high resolution lens-less imaging approach for the characterization of various samples. It has made significant technical progress through developments in source, algorithm and imaging methodologies thus enabling important scientific breakthroughs in a broad range of disciplines. In this report, we will introduce the principles of forward scattering CDI and Bragg geometry CDI (BCDI), with an emphasis on the latter. BCDI exploits the ultra-high sensitivity of the diffraction pattern to the distortions of crystalline lattice. Its ability of imaging strain on the nanometer scale in three dimensions is highly novel. We will present the latest progress on the application of BCDI in investigating the strain relaxation behavior in nanoscale patterned strained silicon-on-insulator (sSOI) materials, aiming to understand and engineer strain for the design and implementation of new generation semiconductor devices.
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