ArticleChemphyschem : a European journal of chemical physics and physical chemistry2012
Chemical etching of zinc oxide for thin-film silicon solar cells.
Article in Chemphyschem : a European journal of chemical physics and physical chemistry, 2012. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 5 papers.
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Who cites it
5 citing papers in PubMed.
- Analysis of Hazy Ga- and Zr-Co-Doped Zinc Oxide Films Prepared with Atmospheric Pressure Plasma Jet Systems.Nanomaterials (Basel, Switzerland) · 2023Article
- ZnS coating for enhanced environmental stability and improved properties of ZnO thin films.RSC advances · 2018Article
- Morphology Transition Engineering of ZnO Nanorods to Nanoplatelets Grafted MoScientific reports · 2017Article
- Analyzing periodic and random textured silicon thin film solar cells by Rigorous Coupled Wave Analysis.Scientific reports · 2014Article
- Ohmic-rectifying conversion of Ni contacts on ZnO and the possible determination of ZnO thin film surface polarity.PloS one · 2014Article
Corrections and comments
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Authors and funding
4 authors.
Funding
No grant is acknowledged in the PubMed record.
Abstract
Chemical etching is widely applied to texture the surface of sputter-deposited zinc oxide for light scattering in thin-film silicon solar cells. Based on experimental findings from the literature and our own results we propose a model that explains the etching behavior of ZnO depending on the structural material properties and etching agent. All grain boundaries are prone to be etched to a certain threshold, that is defined by the deposition conditions and etching solution. Additionally, several approaches to modify the etching behavior through special preparation and etching steps are provided.
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Registered trials
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