ArticleLangmuir : the ACS journal of surfaces and colloids2010
Photo-pens: a simple and versatile tool for maskless photolithography.
Article in Langmuir : the ACS journal of surfaces and colloids, 2010. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 2 papers.
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The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.
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Who cites it
2 citing papers in PubMed.
- Polymeric and biological membranes for organ-on-a-chip devices.Microsystems & nanoengineering · 2023Review
- Polymeric lithography editor: Editing lithographic errors with nanoporous polymeric probes.Science advances · 2017Article
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Authors and funding
5 authors.
Funding
Abstract
We demonstrate conical pores etched in tracked glass chips for fabricating patterns at the micrometer scale. Highly fluorescent patterns based on photopolymerization of diacetylene films were formed by irradiating UV light through conical pores called "photo-pens". The properties of photopens were investigated through experiments, finite-difference-time-domain (FDTD) simulations and numerical calculations based on Fresnel equations. We show that the pattern dimensions are easily controlled by adjusting the exposure time. Thus, patterns with a range of dimensions can be fabricated without any need of changes in the pore diameter. Parallel patterning was also demonstrated by simultaneously exposing the films to photons through multiple pores in the chip. Our method provides an inexpensive, versatile, and efficient way for patterning without the use of sophisticated masks.
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Registered trials
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